Atomic layer deposition: From molecular chemistry to functional oxide coatings
by Pengmei Yu, Superconducting Materials and Large Scale Nanostructures (SUMAN) group
Date: Tuesday, 24 November 2020
Time: 11 am
Venue: Online session from the ICMAB Meeting Room. Register here to attend the PhD Thesis defense via Zoom.
Abstract: The synthesis of transition metal oxides (TMO) by atomic layer deposition (ALD) is contributing to the development of nanomaterials and devices that are difficult to achieve by traditional deposition techniques and hold promising characteristics for various application areas such as energy, electronics and health. Research on developing more robust ALD processes for TMO, expanding the library of compositions and facilitating their integration with dissimilar materials are of great relevance.
In this thesis the efforts have been focused on three different TMO-based systems: Co3O4, Fe2O3 and GdxFeyOz. Upon careful investigation of the key role of metalorganic precursor chemistry on the film composition, structure and properties, we have developed reliable ALD processes for these TMO films. Furthermore, we have contributed to the improvement of surface reactivity of chemically inert carbonaceous materials with TMO via surface functionalization obtaining ALD-TMO@C core shell structures, being of interest for future anode materials in energy storage devices.
- Mariona Coll, SUMAN group, ICMAB-CSIC
- President: Mónica Burriel, Grenoble Institute of Technology, France
- Secretary: Alexandre Ponrouch, ICMAB-CSIC, Spain
- Vocal: Catalina Mansilla, CTECHnano-Coating Technologies S.L., Spain
University: Universitat Autònoma de Barcelona (UAB)
PhD Programme: Materials Science