Atomic Layer Deposition (ALD) is a thin film deposition technique widely used in the synthesis of semiconductor devices and nanomaterials. The main characteristic is its atomic-scale control of the layer thickness and film uniformity. Now, Mariona Coll, researcher at the ICMAB, and Mari Napari, researcher at the University of Southampton, have published a review in the journal APL Materials to describe some of the major achievements and challenges of doped and complex oxides ALD.
Read this interview to Mariona Coll to know more about ALD and its applications!
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